Benefits:

• Superior Coriolis-based flow measurement and control
• Perfectly repeatable film properties
• Uniform film structure throughout the deposition run
• More efficient precursor liquid use due to total and complete vaporization
• Complete absence of decomposition products ensuring particle-free films
• Remarkable dynamic range, handling precursor flows from a few grams per hour to several thousand grams per hour
• The ability of a single vaporizer to handle multiple precursors while ensuring both complete vaporization and complete mixing

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